.等离子体化学气相沉积镀膜设备[J].中国科学院院刊,2023,38(Z1):40.

等离子体化学气相沉积镀膜设备

Plasma Enhanced Chemical Vapor Deposition Coating Equipment
DOI10.16418/j.issn.1000-3045.2023Z104040
微信关注公众号